Χημικές Διεργασίες

Rotary vane pumps from the Pascal Series for backing vacuum and medium vacuum
The single-stage Pascal rotary vane pumps are the result of decades of experience in the design and industrial production of vacuum pumps.
A Complete Line of Single-Stage Rotary Vane Pumps for Low and Medium Vacuum Applications.
We now offer you a complete new line of new single-stage rotary vane pumps for all low and medium vacuum applications.
Rugged Rotary Vane Pump. For Harshest Industrial Use.
The UnoLine Plus is an optimum solution for industrial applications. This rotary vane pump has a proven track record as both a stand-alone pump and as a backing pump for Pfeiffer Vacuum Roots pumps.
Convection Cooled Roots Pumps for Every Low and Medium Vacuum Application.
Our Roots pumps offer pumping speeds ranging from 250 to 25,000 m3/h. They can be safely employed for low and medium vacuum applications in the coating or semiconductor industry, in research & development, metallurgy or in chemistry and process technology.
Multi Stage Root SD Version
The pump is designed for applications that require pumping of clean (dust-free) and non corrrosive gases. Standard pumps are equipped with a gas ballast device to improve pumping of light gases and avoid condensation vapors inside the pump.
G versions (ACP 15 / ACP 28 / ACP 40)
G version pump is compatible with trace amounts of corrosive gases. Three jets located in the purge line help withstand trace amounts of corrosive chemicals, protect the low and high pressure ball bearings.