Our Roots pumps offer pumping speeds ranging from 250 to 25,000 m3/h. They can be safely employed for low and medium vacuum applications in the coating or semiconductor industry, in research & development, metallurgy or in chemistry and process technology.
The pump is designed for applications that require pumping of clean (dust-free) and non corrrosive gases. Standard pumps are equipped with a gas ballast device to improve pumping of light gases and avoid condensation vapors inside the pump.
G version pump is compatible with trace amounts of corrosive gases. Three jets located in the purge line help withstand trace amounts of corrosive chemicals, protect the low and high pressure ball bearings.
CV versions extend the pure water vapor capacity up to 1000 g/h (at 100 mbar and 30 °C ambient temperature).
A high gas ballast flow warms up the pump and dilutes condensable gases (> 2 N.m3/h or 33 slm at 1 bar abs.).
Dry Screw Pumps. Optimum Ultimate Pressure. Absolutely Oil-Free. Cool-Running.